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Загальна кількість знайдених документів : 2
Представлено документи з 1 до 2
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Bunak S. V. Electrical properties of semiconductor structures with Si nanoclusters in SiO2 grown by high temperature annealing technology of SiOX layer, X<2 [Електронний ресурс] / S. V. Bunak, A. A. Buyanin, V. V. Ilchenko, V. V. Marin, V. P. Melnik, I. M. Khacevich, O. V. Tretyak, A. G. Shkavro // Semiconductor physics, quantum electronics & optoelectronics. - 2010. - Vol. 13, № 1. - С. 12-18. - Режим доступу: http://nbuv.gov.ua/UJRN/MSMW_2010_13_1_5 The theoretical and experimental investigations of electrical properties of the SiO2/Si-ncs/SiO2/Si structures grown by high temperature annealing SiOX, <$Eroman X~<<~2>, have been carried out. The influence of Si cluster growth conditions on frequency dependences of <$EC~-~V> characteristics, static and dynamic conductance of investigated structures has been clearly observed. As a result of theoretical modeling, <$EC~-~V> dependences have been calculated. The experimentally obtained negative constituent of differential capacitance has been qualitatively described. It has been experimentally found that the SiO2/Si-ncs/SiO2/Si structures with the tunnel dielectric layer revealed the effect of memorizing.
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Bunak S. V. Electrical properties of MIS structures with silicon nanoclusters [Електронний ресурс] / S. V. Bunak, V. V. Ilchenko, V. P. Melnik, I. M. Hatsevych, B. N. Romanyuk, A. G. Shkavro, O. V. Tretyak // Semiconductor physics, quantum electronics & optoelectronics. - 2011. - Vol. 14, № 2. - С. 241-246. - Режим доступу: http://nbuv.gov.ua/UJRN/MSMW_2011_14_2_22 The theoretical and experimental investigations of electrical properties of the Al-SiO2-(Si - ncs)-SiO2-Si structures grown using high temperature annealing SiOx, <$E x~<<~2>, have been carried out. It has been experimentally found that the Al-SiO2-(Si - ncs)-SiO2-Si structures with the tunnel dielectric layer revealed the effect of dynamic memory. Electric properties and parameters of the interface states located between Si - ncs and SiO2 were studied in detail by measuring of current-voltage, capacitance-voltage, and thermally stimulated current characteristics.
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